Pret, J.-C.: search on Z-Library

The world's largest scientific articles store. 70,000,000+ articles for free.

Don't use scam websites

1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advanced Etch Technology for Nanopatterning - Dry etching challenges for patterning smooth lines: LWR reduction of extreme ultra violet photo resist

Altamirano-Sánchez, Efraín, Vaglio Pret, Alessandro, Gronheid, Roel, Boullart, Werner, Zhang, Ying

Year:

2012

Language:

english

File:

PDF, 3.86 MB

english, 2012

2

Line edge and width roughness smoothing by plasma treatment

De Schepper, Peter, Hansen, Terje, Altamirano-Sanchez, Efrain, Pret, Alessandro Vaglio, el Otell, Ziad, Boulart, Werner, De Gendt, Stefan

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2014

Language:

english

File:

PDF, 2.26 MB

english, 2014

3

Painting the full picture: The conversion of economic, cultural, social and symbolic capital

Pret, T., Shaw, E., Drakopoulou Dodd, S.

Journal:

International Small Business Journal

Year:

2015

Language:

english

File:

PDF, 816 KB

english, 2015

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Modeling the lithography of ion implantation resists on topography

Lai, Kafai, Erdmann, Andreas, Winroth, Gustaf, Vaglio Pret, Alessandro, Ercken, Monique, Robinson, Stewart A., Biafore, John J.

Year:

2014

Language:

english

File:

PDF, 2.30 MB

english, 2014

5

Futile and False Rejoinders, Sophistical Arguments and Early Indian Logic

Journal:

Journal of Indian Philosophy

Year:

2001

Language:

english

File:

PDF, 131 KB

english, 2001

6

Mask roughness impact on extreme UV and 193nm immersion lithography

Garidis, Konstantinos, Pret, Alessandro Vaglio, Gronheid, Roel

Journal:

Microelectronic Engineering

Year:

2012

Language:

english

File:

PDF, 683 KB

english, 2012

7

The weathering intensity scale (WIS): An alternative approach of the Chemical Index of Alteration (CIA)

Meunier, A., Caner, L., Hubert, F., El Albani, A., Pret, D.

Journal:

American Journal of Science

Year:

2013

Language:

english

File:

PDF, 503 KB

english, 2013

8

Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result

Pret, Alessandro Vaglio

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2011

Language:

english

File:

PDF, 562 KB

english, 2011

9

Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations

Constantoudis, Vassilios, Papavieros, George, Gogolides, Evangelos, Pret, Alessandro Vaglio, Pathangi, Hari, Gronheid, Roel

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2017

Language:

english

File:

PDF, 4.24 MB

english, 2017

10

Line Width Roughness mitigation in chemically amplified resist by post-litho processes

Alessandro Vaglio Pret, Roel Gronheid

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 446 KB

english, 2010

11

A fast algorithm for bottom-up document layout analysis

Simon, A., Pret, J.-C., Johnson, A.P.

Journal:

IEEE Transactions on Pattern Analysis and Machine Intelligence

Year:

1997

Language:

english

File:

PDF, 79 KB

english, 1997

12

Upscaling the porosity of the Callovo-Oxfordian mudstone from the pore scale to the formation scale; insights from the 3H-PMMA autoradiography technique and SEM BSE imaging

Robinet, J.C., Sardini, P., Siitari-Kauppi, M., Prêt, D., Yven, B.

Journal:

Sedimentary Geology

Year:

2015

Language:

english

File:

PDF, 2.19 MB

english, 2015

13

Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

Kuppuswamy, Vijaya-Kumar Murugesan, Constantoudis, Vassilios, Gogolides, Evangelos, Pret, Alessandro Vaglio, Gronheid, Roel

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 4.78 MB

english, 2013

14

Optimization of pore-network characterization of a compacted clay material by TEM and FIB/SEM imaging

Gaboreau, Stéphane, Robinet, Jean-Charles, Prêt, Dimitri

Journal:

Microporous and Mesoporous Materials

Year:

2015

Language:

english

File:

PDF, 16.81 MB

english, 2015

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: Part 2

Wood, Obert R., Panning, Eric M., Vaglio Pret, Alessandro, De Bisschop, Peter, Smith, Mark D., Biafore, John J.

Year:

2014

Language:

english

File:

PDF, 4.26 MB

english, 2014

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Impact of stochastic effects on EUV printability limits

Wood, Obert R., Panning, Eric M., De Bisschop, P., Van de Kerkhove, J., Mailfert, J., Vaglio Pret, A., Biafore, J.

Year:

2014

Language:

english

File:

PDF, 1.37 MB

english, 2014

17

Expanding the Domain of Festival Research: A Review and Research Agenda

Wilson, Juliette, Arshed, Norin, Shaw, Eleanor, Pret, Tobias

Journal:

International Journal of Management Reviews

Year:

2016

Language:

english

File:

PDF, 571 KB

english, 2016

18

A Physics-based Model for Negative Tone Development Materials

Fang, Chao, Smith, Mark D., Robertson, Stewart, Biafore, John J., Pret, Alessandro Vaglio

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 263 KB

english, 2014

19

The importance of ‘fitting in’: collaboration and social value creation in response to community norms and expectations

Pret, Tobias, Carter, Sara

Journal:

Entrepreneurship & Regional Development

Year:

2017

Language:

english

File:

PDF, 1.81 MB

english, 2017

20

Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories

Pavel Poliakov, Pieter Blomme, Alessandro Vaglio Pret, Miguel Miranda Corbalan, Roel Gronheid, Diederik Verkest, Jan Van Houdt, Wim Dehaene

Journal:

Microelectronics Reliability

Year:

2012

Language:

english

File:

PDF, 732 KB

english, 2012

21

Proteomic Analysis of Mature Soybean Seeds from the Chernobyl Area Suggests Plant Adaptation to the Contaminated Environment

Danchenko, Maksym, Skultety, Ludovit, Rashydov, Namik M., Berezhna, Valentyna V., Mátel, L’ubomír, Salaj, Terézia, Pret’ová, Anna, Hajduch, Martin

Journal:

Journal of Proteome Research

Year:

2009

Language:

english

File:

PDF, 1.56 MB

english, 2009

22

Indirect estimation of the clay content of clay-rocks using acoustic measurements: New insights from the Montiers-sur-Saulx deep borehole (Meuse, France)

Cosenza, P., Robinet, J.C., Prêt, D., Huret, E., Fleury, M., Géraud, Y., Lebon, P., Villiéras, F., Zamora, M.

Journal:

Marine and Petroleum Geology

Year:

2014

Language:

english

File:

PDF, 3.56 MB

english, 2014

23

Corrosion of metal iron in contact with anoxic clay at 90°C: Characterization of the corrosion products after two years of interaction

Schlegel, Michel L., Bataillon, Christian, Brucker, Florence, Blanc, Cécile, Prêt, Dimitri, Foy, Eddy, Chorro, Matthieu

Journal:

Applied Geochemistry

Year:

2014

Language:

english

File:

PDF, 4.41 MB

english, 2014

24

[IEEE 2012 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2012.12.10-2012.12.13)] 2012 International Electron Devices Meeting - Opportunities and challenges in device scaling by the introduction of EUV lithography

Ronse, K., De Bisschop, P., Vandenberghe, G., Hendrickx, E., Gronheid, R., Pret, A. Vaglio, Mallik, A., Verkest, D., Steegen, A.

Year:

2012

Language:

english

File:

PDF, 439 KB

english, 2012

25

Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes

Vaglio Pret, Alessandro

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2010

Language:

english

File:

PDF, 680 KB

english, 2010

26

In-situ interaction of cement paste and shotcrete with claystones in a deep disposal context

Gaboreau, S., Lerouge, C., Dewonck, S., Linard, Y., Bourbon, X., Fialips, C. I., Mazurier, A., Pret, D., Borschneck, D., Montouillout, V., Gaucher, E. C., Claret, F.

Journal:

American Journal of Science

Year:

2012

Language:

english

File:

PDF, 23.85 MB

english, 2012

27

Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for extreme ultraviolet lithography

Pret, Alessandro Vaglio

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2010

Language:

english

File:

PDF, 1.34 MB

english, 2010

28

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at λ = 193nm

Capetti, Gianfranco, Cantù, Pietro, Galassini, Elisa, Vaglio Pret, Alessandro, Turco, Catia, Vaccaro, Alessandro, Rigolli, Pierluigi, D'Angelo, Fabrizio, Cotti, Gina, Flagello, Donis G.

Year:

2007

Language:

english

File:

PDF, 1.09 MB

english, 2007

29

Evidence of speckle in extreme-UV lithography

Pret, Alessandro Vaglio, Gronheid, Roel, Engelen, Jan, Yan, Pei-Yang, Leeson, Michael J., Younkin, Todd R.

Journal:

Year:

2012

Language:

english

File:

PDF, 2.56 MB

english, 2012

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Roughness and variability in EUV lithography: Who is to blame? (part 1)

Vaglio Pret, Alessandro, Naulleau, Patrick P., Gronheid, Roel, Younkin, Todd R., Winroth, Gustaf, Biafore, John J., Anno, Yusuke, Hoshiko, Kenji, Constantoudis, Vassilios

Year:

2013

Language:

english

File:

PDF, 529 KB

english, 2013

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Impact of post-litho LWR smoothing processes on the post-etch patterning result

Foubert, Philippe, Allen, Robert D., Somervell, Mark H., Vaglio Pret, Alessandro, Altamirano Sanchez, Efrain, Gronheid, Roel

Year:

2011

Language:

english

File:

PDF, 2.16 MB

english, 2011

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Gaining insight into effective metrology height through the use of a compact CDSEM model for lithography simulation

Sanchez, Martha I., Ukraintsev, Vladimir A., Fang, Chao, Graves, Trey, Vaglio Pret, Alessandro, Robertson, Stewart, Smith, Mark

Year:

2016

Language:

english

File:

PDF, 1.05 MB

english, 2016

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Resist fundamentals for resolution, LER, and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects

Rathsack, Benjamin, Henderson, Clifford L., Nafus, Kathleen, Hatakeyama, Shinichi, Kuwahara, Yuhei, Kitano, Junichi, Gronheid, Roel, Vaglio Pret, Alessandro

Year:

2009

Language:

english

File:

PDF, 562 KB

english, 2009

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Impact of mask line roughness in EUV lithography

Vaglio Pret, Alessandro, La Fontaine, Bruno M., Naulleau, Patrick P., Gronheid, Roel, Graves, Trey, Smith, Mark D., Biafore, John

Year:

2011

Language:

english

File:

PDF, 529 KB

english, 2011

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Modeling and simulation of low-energy electron scattering in organic and inorganic EUV photoresists

Hohle, Christoph K., Gronheid, Roel, Vaglio Pret, Alessandro, Graves, Trey, Blankenship, David, Biafore, John J.

Year:

2017

Language:

english

File:

PDF, 4.51 MB

english, 2017

36

Artisan entrepreneurship: a systematic literature review and research agenda

Pret, Tobias, Cogan, Aviel

Journal:

International Journal of Entrepreneurial Behaviour & Research

Year:

2018

Language:

english

File:

PDF, 373 KB

english, 2018

37

Effect of microstructure on hydric strain in clay rock: A quantitative comparison

Fauchille, Anne-Laure, Hedan, Stephen, Valle, Valéry, Prêt, Dimitri, Cabrera, Justo, Cosenza, Philippe

Journal:

Applied Clay Science

Year:

2019

Language:

english

File:

PDF, 3.67 MB

english, 2019

38

Representative elementary area of shale at the mesoscopic scale

Cosenza, Philippe, Prêt, Dimitri, Fauchille, Anne-Laure, Hedan, Stephen

Journal:

International Journal of Coal Geology

Year:

2019

Language:

english

File:

PDF, 2.91 MB

english, 2019

39

Über die Darstellung von Chlor mittels Braunstein und Salpetersäure

G. Lunge, C. Pret

Journal:

Angewandte Chemie

Year:

1893

Language:

german

File:

PDF, 736 KB

german, 1893

40

Hedgehog signaling controls Soma-Germen interactions during Drosophila ovarian morphogenesis

Florence Besse, Denise Busson, Anne-Marie Pret

Journal:

Developmental Dynamics

Year:

2005

Language:

english

File:

PDF, 504 KB

english, 2005

41

Influence of the ionic strength and solid/solution ratio on Ca(II)-for-Na+ exchange on montmorillonite. Part 1: Chemical measurements, thermodynamic modeling and potential implications for trace elements geochemistry

E. Tertre, D. Prêt, E. Ferrage

Journal:

Journal of Colloid and Interface Science

Year:

2011

Language:

english

File:

PDF, 398 KB

english, 2011

42

Mask line roughness contribution in EUV lithography

Alessandro Vaglio Pret, Roel Gronheid

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 1.23 MB

english, 2011

43

Acute calcium homeostasis in mhs swine

Gaisford G. Harrison, David F. Morrell, Virginia Brain Bvsc(Pret), George G. Jaros, DSc(Pret)

Journal:

Canadian Journal of Anesthesia/Journal canadien d'anesthésie

Year:

1987

Language:

english

File:

PDF, 181 KB

english, 1987

44

Histological study of embryo-like structures initiated from hypocotyl segments of flax (Linum usitatissimumL.)

J. Salaj, B. Petrovská, B. Obert, A. Pret'ová

Journal:

Plant Cell Reports

Year:

2005

Language:

english

File:

PDF, 417 KB

english, 2005

45

Haploid formation in maize, barley, flax, and potato

A. Pret’ová, B. Obert, Z. Bartošová

Journal:

Year:

2006

Language:

english

File:

PDF, 326 KB

english, 2006

46

Flax anther culture: effect of genotype, cold treatment and media

Bohuš Obert, Beata Dedičová, Andrea Hricová, Jozef šamaj, Anna Pret'ová

Journal:

Plant Cell, Tissue and Organ Culture

Year:

2004

Language:

english

File:

PDF, 108 KB

english, 2004

47

Plant cell and biotechnology studies inLinum usitatissimum– a review

Steve Millam, Bohuš Obert, Anna Pret’ová

Journal:

Plant Cell, Tissue and Organ Culture

Year:

2005

Language:

english

File:

PDF, 229 KB

english, 2005

48

Physiological apoptosis of polar cells during Drosophila oogenesis is mediated by Hid-dependent regulation of Diap1

Khammari, A, Agnès, F, Gandille, P, Pret, A-M

Journal:

Cell Death & Differentiation

Year:

2010

Language:

english

File:

PDF, 1.80 MB

english, 2010

49

Leaf developmental stage and tissue location affect the detection of β-glucuronidase in transgenic tobacco plants

A. Pret'ová, B. Obert, H.Y. Wetzstein

Journal:

Biotechnology Letters

Year:

2001

Language:

english

File:

PDF, 39 KB

english, 2001

50

Orientational dependence of luminescence yield excited by fast electrons in NaCl crystals

V. A. Prets, V. A. Kuz'minykh, S. V. Plotnikov, E. I. Rozum

Journal:

Russian Physics Journal

Year:

1979

Language:

english

File:

PDF, 343 KB

english, 1979